Coated cutting tool

ABSTRACT

The present invention relates to a cutting tool insert comprising a substrate and a coating including at least one layer of TiB 2 . The TiB 2 -layer has a fibrous microstructure where the grains are 5-50 nm, preferably 10-30 nm, in diameter and a length more than 250 mu, preferably more than 400 nm long, with a length to diameter ratio, l/d&gt;2, preferably &gt;5, and oriented essentially perpendicularly to the surface of the substrate.

RELATED APPLICATION INFORMATION

This application is a divisional application of application Ser. No. 10/106,116, filed on Mar. 27, 2002, now U.S. Pat. No. 6,770,358 and claims priority under 35 U.S.C. §§119 and/or 365 to Application No. 0101111-3 filed in Sweden on Mar. 28, 2001, the entire contents of each of these documents is hereby incorporated by reference.

FIELD OF THE INVENTION

The present invention relates to a cutting tool for machining by chip removal comprising a substrate of cemented carbide, cermet, ceramics or high speed steel and a hard and wear resistant refractory coating. According to a preferred aspect, the coating is composed of one or more layers of refractory compounds of which at least one layer comprise a low compressive stress boride layer, e.g. TiB₂ or ZrB₂, preferably TiB₂ deposited by Physical Vapour Deposition (PVD). The TiB₂ and the rest of the layer(s), if any at all, are composed of metal nitrides and/or carbides and/or oxide with the metal elements chosen from Ti, Nb, Hf, V, Ta, Mo, Zr, Cr, W and Al.

BACKGROUND OF THE INVENTION

In the description of the background of the present invention that follows reference is made to certain structures and methods, however, such references should not necessarily be construed as an admission that these structures and methods qualify as prior art under the applicable statutory provisions. Applicants reserve the right to demonstrate that any of the referenced subject matter does not constitute prior art with regard to the present invention.

Industrial use of PVD TiB₂ layers has so far been strongly limited due to the very high compressive stresses normally possessed by such layers. In recent years large efforts have been made to develop PVD processes for deposition of new ultra-hard thin layers, e.g. boron carbide (B₄C), titanium diboride (TiB₂) and cubic boron nitride (c-BN), for wear protection, especially of cutting tools. Although these layer materials are very attractive for the tooling industry, they have not yet become commercialized.

The high hardness and Young's modulus of TiB₂, as well as its chemical resistance, are attributed to the crystal structure and atomic bonding. In TiB₂ the Ti atoms form a metallic hexagonal structure. In analogy with the usual notation ABABAB for hexagonal close packing, the stacking sequence of Ti in TiB₂ will be AAA. The boron (B) atoms are situated interstitially between the A-layers forming a strong covalently bonded hexagonal net. The sequence may be described as AHAHAH where H denotes a boron layer. The combination of metallic Ti and strongly covalently bonded B results in a compound with high thermal and electrical conductivity as well as high yield strength and chemical resistance.

TiB₂ layers have been deposited by various PVD techniques, such as reactive sputtering, arc evaporation, and most commonly, magnetron sputtering. However, despite the very interesting properties of the TiB₂ bulk material, these layers are generally of little commercial interest. Their stress level is too high, which limits the practical adhesion, and thereby the layer thickness. In addition, due to the high intrinsic stressed layers are too brittle and easily fail because of lack of cohesion.

U.S. Pat. No. 4,019,873 discloses a coated cemented carbide cutting tool insert. The coating is composed of two superimposed layers including an outer, extremely wear-resistant layer consisting essentially of aluminium oxide and/or zirconium oxide. The inner layer is composed of at least one boride selected from the group consisting of borides of the elements titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum and tungsten.

U.S. Pat. No. 4,268,582 discloses a coated cemented carbide cutting tool insert comprising a cemented carbide substrate, the surface regions thereof having diffused therein an element such as boron, silicon or aluminium. The inserts further comprise a layer disposed on the diffused substrate, the layer being a boride such as titanium boride, hafnium boride, zirconium boride or tantalum boride. In another embodiment, the coated cemented article further includes an interlayer sandwiched between the diffused substrate and the boride layer.

Both these patents deposit the TiB₂-layers by CVD. However, because of the high temperature during CVD-deposition undesirable cobalt/boride-phases are formed. For that reason PVD deposition of TiB₂-layers on WC-Co based substrates is preferred.

M. Berger, M. Larsson and S. Hogmark, Surf. Coat. Technol., 124 (2000) 253-261 have grown TiB₂ layers with magnetron sputtering using negative substrate bias varying from −220V to −50 V, the residual stress were very high (i.e.—compressive stress from −10.2 GPa to −7.9 GPa). Also, one variant using 0 V was grown also resulting in a very high compressive residual stress of −6.1 GPa. In this investigation no films were grown using positive bias.

C. Mitterer, M. Rauter and P. Rodhamrnmer, Surf. Coat. Technol., 41 (1990) 351-363 have grown TiB₂ and Ti—B—N—C compound layers with magnetron sputtering using negative substrate bias. The TiB₂ layers were in high compressive residual stresses (˜−4 GPa).

R. Wiedemann and H. Oettel, Surface Engineering, 14 4 (1998) 299-304 also have grown TiB₂ layers using magnetron sputtering. A negative substrate bias was used resulting in intrinsic compressive stress of ˜−2 GPa. The hardness was low (25-29 GPa).

One possibility to obtain a low compressive residual stress state boride layer would be, for example, to grow at a high pressure, or other condition reducing ion bombardment. However, this will give a layer with a columnar structure, often associated with grain boundaries that lack density, and a cauliflower shaped surface morphology. This microstructure is not preferable since a typical application of TiB₂ layers are, for example, machining of soft and sticky aluminium alloys, which require the coating of the cutting tool to have a very smooth top surface in order to reduce the tendency to form a build-up edge. Of course, grain boundaries that are not dense are detrimental for the wear-resistance of the coating.

SUMMARY OF THE INVENTION

It is an object of the present invention to provide a TiB₂-coated cemented carbide cutting tool insert.

It is a further object of the present invention to provide a method for depositing TiB₂ layers with low compressive residual stresses. The low stress TiB₂ layer should possess a dense, fibrous microstructure, and a smooth top-surface.

According to a first aspect, the present invention provides a cutting tool insert comprising a substrate and a coating, the coating comprising at least one layer of TiB₂ having a fibrous microstructure wherein the (e.g.—cylindrical) grains are 5-50 nm (in diameter), an average of approximately 15 nm in diameter, and more than 250 nm long, with a length to diameter ratio l/d>2, and the fibrous grains are oriented essentially perpendicularly to a surface of the substrate.

According to a second aspect, the present invention provides a method of making a cutting tool insert comprising a substrate and a coating including at least one layer of TiB₂ having a fibrous microstructure by PVD magnetron sputtering, the method compromising utilizing a bias voltage, V_(s)>0 V.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a photomicrograph of a cross-section of a relatively thin refractory layer formed according to the present invention.

FIG. 2 is a photomicrograph of a cross-section of a relatively thick refractory layer formed according to the present invention.

FIG. 3 is a schematic illustration of a magnetron sputtering device utilized in association with the present invention.

FIG. 4 is a TEM micrograph of a relatively thin layer formed according to the principles of the present invention.

DETAILED DESCRIPTION OF THE INVENTION

In the following description the residual stress state, σ_(tot), denote the total stress of a coating on the actual substrate, i.e.—the sum of the thermal stresses, σ_(thermal), due to difference in coefficient of thermal expansion between the substrate and the coating material, and the intrinsic stresses, σ_(int), originating from the actual growth process, i.e.—σ_(tot)=σ_(thermal)+σ_(int).

FIG. 1 shows the microstructure, in cross-section, of a relatively thin layer of TiB₂-layer (4 μm), according to the present invention. FIG. 2 is a corresponding picture of a thick layer (60 μm). FIG. 3 schematically shows the used magnetron sputtering equipment. FIG. 4 shows a TEM micrograph layer of a thin layer (4 μm).

In these figures S=substrate, P=pumping unit, M=magnetron, sputtering source, V_(s)=substrate potential (bias), I_(s)=substrate current, V_(t)=target potential, I_(t)=target current.

According to the present invention there is provided a cutting tool for machining by chip removal of materials such as non-ferrous material such as aluminium alloys. The cutting tool comprises a body of a hard alloy of cemented carbide, cermet, ceramics or high speed steel onto which a hard and wear resistant refractory coating is deposited. The wear resistant coating is composed of one or more layers of refractory compounds of which at least one layer, preferably the outermost layer, is composed of TiB₂, and that the innermost layer(s), if any at all, between the tool body and the TiB₂-layer, is composed of metal nitrides and/or carbides and/or oxides with the metal elements selected from Ti, Nb, Hf, V, Ta, Mo, Zr, Cr, W and Al. The TiB₂-layers are a dense, crystalline TiB₂ free of cracks with a fine-grained fibrous morphology described below.

The fine-grained fibrous TiB₂-layer can also be deposited directly onto a cutting tool substrate of cemented carbide, cermet, ceramics or high speed steel. The thickness of the TiB₂ layer(s) varies from 0.5 to 60 μm preferably from 1 to 15 μm, for metal machining. The total coating thickness according to the present invention varies from 0.5 to 60 μm, preferably from 1 to 20 μm, with the thickness of the non-TiB₂-layer(s) varying from 0.1 to 15 μm. Further, layers of metal nitrides and/or carbides and/or oxide with the metal elements selected from Ti, Nb, Hf, V, Ta, Mo, Zr, Cr, W and Al can be deposited on top of the TiB₂-layer.

In an alternative embodiment, a process according to the present invention can be used to deposit layers thicker than 50 μm with retained mechanical properties and adhesion to the substrate, due to the capability of the process capability to grow layers free of intrinsic stress.

In another alternative embodiment, thin layers (0.2-3 μm) with an increased effective adhesion can be deposited.

In a preferred embodiment the TiB₂-layer is the outermost layer and with an average surface roughness R_(a) of not more than 50 nm.

This invention refers specially to a layer consisting of a fibrous morphology. PVD layers typically have a columnar morphology, i.e.—some grains have a tendency to increase in diameter on behalf of other grains. However, the TiB₂ layer according to present invention are grown in a mode where the fibrous morphology are kept almost unaffected from a layer thickness of 0.2 μm up to more than 60 μm. This morphology is in most cases preferable if a high cohesive strength of the grain boundaries are achieved. This is probably because of the small grain size in the direction abrasive wear, and large grain size in the direction of the applied compressive stress originating from the machining operation, giving a tougher coating material. FIG. 1 shows a fracture cross-section of a relatively thin layer (4 μm) and FIG. 2 shows a thick layer (60 μm). It is clearly evident that the morphology is almost unaffected by the layer thickness. FIG. 4 shows a TEM micrograph layer of a thin layer (4 μm), that after the first fine grained nucleation zone, about 100 nm thick, the fibrous morphology develops. The grains are typically 5-50 nm in diameter, preferably 10-30 nm in average, ˜15 nm in diameter, and a length more than 250 nm, preferably more than 400 nm. The fibrous grains may be generally cylindrical in shape. The fibrous grains have a length to diameter ratio, l/d>2, preferably >5, and d varies little over the main length of the grains. The fibers are oriented perpendicularly to the surface of the substrate.

The fine-grained, fibrous crystalline TiB₂ according to the invention is strongly textured in the [001]-direction, a texture coefficient, TC, can be defined as. ${{TC}\quad({hkl})} = {\frac{I\quad({hkl})}{I_{0}\quad({hkl})}\left\lbrack {\frac{1}{n}{\sum\limits_{1}^{n}\frac{I\quad({hkl})}{I_{0}\quad({hkl})}}} \right\rbrack}^{- 1}$

where

I(hkl)=measured intensity of the (hkl) reflection

I_(O)(hkl)=standard intensity from the ASTM standard powder pattern diffraction data (JCPDS 35-0741)

n=number of reflections used in the calculation (in this case 8)

(hkl) reflections used are: (001), (100), (101), (110) (102+111), (201), (112) and (103+210). Where e.g. (103+210) means that those two, very close reflections, are treated as one reflection having the sum of intensity of the two. According to the present invention, the TC for the set of (001) crystal planes is greater than 5, preferably greater than 6.5.

In addition, TiB₂-layers according to the present invention exhibit a residual stress state of σ_(tot)<0 GPa but larger than −1 GPa, preferably −0.5 GPa, when deposited on WC-6 wt % Co substrate. This corresponds to an intrinsic stress state, σ_(int), close to zero. The thermal stresses, σ_(thermal), can be calculated using $\sigma_{thermal} = {\frac{E_{f}}{\left( {1 - v_{f}} \right)} \cdot \left( {\alpha_{f} - \alpha_{sub}} \right) \cdot \left( {T_{dep} - T_{ana}} \right)}$

where E_(f) and v_(f) are the Young's modulus and Poisson's ratio of the film, respectively. α_(f) and α_(sub) the coefficient of thermal expansion of the film and substrate material. T_(dep) and T_(ana) the deposition and analyse temperature in K. It is important to do the estimate of the thermal stresses by using the thermal expansion in the a-direction of the TiB₂ lattice, since due to the (001) texture almost all grains are oriented so that direction is parallel to the substrate surface. Using α_(sub)=4.8*10⁻⁶, α_(TiB2,a)=3.56*10⁻⁶, E_(f)=600 GPa, v_(f)=0.22, T_(dep)=773 K, T_(ana)=273 K in the equation above gives σ_(thermal)=−0.5 GPa.

The residual stress, σ_(tot), is determined using the well-known beam deflection technique.

The intrinsic stress can then be obtained by applying the equation: σ_(int)=σ_(tot)−σ_(thermal)

The intrinsic stress, σ_(int), of coatings deposited with positive bias is therefore:

σ_(int)=−0.5−(−0.5)=0 GPa, i.e.—those coatings are grown in a stress free mode.

According to the method of the present invention TiB₂ layers with low compressive residual stresses are deposited by magnetron sputtering of a TiB₂ target under the following conditions:

Magnetron power: 3-20 kW

Substrate current I_(s): −1−−15 A

Atmosphere: Ar

Pressure: <10⁻² mbar, preferably <10⁻³ mbar

Bias voltage V_(s): >0 preferably >+5 V but <+60 V. The substrate current I_(s) changes polarity because of the positive V_(s). This corresponds to low energetic ion bombardment and electron bombardment of the growing layer surface.

Layers deposited with the standard technology using negative V_(s) have a columnar structure. Here “columnar structure” describes a layer morphology where the grains, after the initially nucleation zone, have conical shape some with increasing diameter (in the plane parallel to the substrate surface), and other grains with decreasing diameter. This mode of growth is controlled by competition between different grains, where some grow out from others.

On the other hand, layers deposited with positive bias according to this invention consist of a fibrous morphology. No elements other than Ti, B, and small impurities of Ar are found in the layers, indicating that no sputtering from chamber walls occurs although the plasma potential probably is high when applying a positive potential.

While not intending to limit the invention to any particular theory, it is believed that the low stress level of layers according to the present invention is due to a combination of three effects: first, increased bulk temperature and adatom mobility; secondly, minimisation of energetic ion bombardment during growth; and thirdly, an electron bombardment of the surface enhancing surface mobility and increasing the nucleation rates. Also, is it likely that the electron current increases the desorption rate of absorbed hydrogen and/or water molecules from the surface. All this together result in drastically reduced residual stress compared to layers grown with negative substrate bias.

The residual stress state of layers grown according to present invention are almost free of intrinsic stress, i.e.—the slightly compressive stress state measured originate only from the difference in coefficient of thermal expansion between the substrate and the layer.

The present invention has been described with reference to TiB₂-layers. It is obvious that the method can also be applied to the deposition of other wear resistant material where high compressive stresses is a problem such as ZrB₂-layers or other borides.

EXAMPLE 1

TiB₂-layers were deposited in a commercially available deposition system aimed for thin film deposition equipped with a dc magnetron sputter source with a TiB₂ target (12.5×25.5 cm²).

Mirror-polished cemented carbide substrates with composition 6 wt % Co and 94 wt % WC were used. The WC grain size was about 1 μm and the hardness was 1650 HV₁₀.

Before deposition, the substrates were cleaned in an ultrasonic bath of an alkali solution and in alcohol. The substrates were stationarily positioned 5 cm above the magnetron and resistively heated by an electron beam for 50 min to about 450° C. Immediately after heating, the substrates were argon-ion etched (ion current density 5.4 mA/cm²) for 30 minutes using a substrate bias of −200V. The subsequent TiB₂ deposition was carried out at the following seven different bias voltages, V_(s); −200V, −110V, +10V, +25V, +35V and +50V. A magnetron power of 6 kW, resulting in a target potential of about 500V and an Ar pressure of 3×10⁻³ mbar were maintained during deposition of all layers. The resulting thickness of the positively biased layers was ˜4 μm. The negatively biased layers were made somewhat thinner (˜3 μm) to avoid layer failure due to their higher residual stresses. The substrate temperature was measured with a thermocouple attached to the substrate holder.

The substrate current I_(s) was +1.2 A for negative V_(s), irrespective of voltage. When changing from negative to positive V_(s) the substrate current changed sign from positive to negative. The current was also found to increase with increasing positive V_(s) up to +25V whereafter it started to level of around 13 A for further V_(s) increase.

Using a positive V_(s) resulted in a substrate temperature at the end of deposition T_(dep) increase to about 200° C. higher than using negative V_(s). However, the different positive or negative V_(s) did not significantly influence T_(dep).

XRD analysis showed that all films exhibited the hexagonal hcp-TiB₂ phase with a strong (001) texture with a texture coefficient as defined above of 6.5 or more, i.e.—no other diffraction peaks where detected. The FWHM values of the (001) peak showed that the positively biased layers gave sharper peaks than those formed with negative V_(s). No influence was seen on FWHM within the positive range of V_(s), while for negative V_(s), FHWM increased with the voltage.

SEM studies of fracture cross-sections revealed columnar structure for layers deposited with negative V_(s). It was more pronounced for −200V than for −110V. For positive V_(s), no columnar growth was observed. However, in higher magnification, a dense, fibrous morphology was observed on positively biased layers see FIG. 1. EDS analysis indicated that all layers were slightly overstoichiometric in B. The Ti/B ratio was typically 0.46 for all layers independent of V_(s). Layers grown with negative V_(s) contained as much as 8 at % Ar for V_(s)=−200V, while when using positive V_(s) no Ar could be detected. No other elements than Ti, B and Ar could be found in any layer.

By applying a positive V_(s), independent of value, layers with low compressive residual stress states, i.e.—σ_(tot)≈−0.5 GPa, were obtained. This stress state corresponds roughly to the thermal stress state. On the other hand, using negative V_(s) gave layers with residual stresses in the range of −7 to −10 GPa.

All layers exhibited H and E values of about 50 and 600 GPa (measured with nanoindentation technique), respectively.

The abrasive wear rate was about 25-30 μm³/mmN for all layers, except the one grown with V_(s)=−200V which showed about 50% higher wear rate than the other.

From a scratch test it was concluded that the adhesion was good for all layers, and in all cases the initial layer failure was of a cohesive type. There was no significant difference in critical load F_(N,C) among the layers deposited with positive bias. They were all in the 42-46 N range. The layers deposited with negative V_(s) displayed a lower F_(N,C), about 25-30 N, and also a higher amount of cohesive failures at the rim of the scratch, than layers deposited with positive V_(s). Though, the scratch test demonstrate that coatings according to present invention have strongly enhanced toughness properties compared with coatings grown using negative bias.

The surface roughnesses, Ra, were measured with a interferometric method using a Wyco MD-2000 instrument. Of course will Ra of the coating be influenced by the surface roughness of the substrate for thin coatings, as in this example, here was Ra of the substrate ˜5 nm. i.e.—the increase in Ra after deposition (˜5 nm to ˜20 nm) is extremely small.

It is obvious that the surface roughness decreases when changing the substrate bias, V_(s), from negative to positive see table 1. However, no significant difference between different coatings grown with different positive bias could be seen.

TABLE 1 Bias voltage and properties of the TiB₂ layers. Wear FWHM rate V_(s) (001) H E F_(N,C) [μm³/m Ra [V] [2θ] σ [GPa] [Gpa] [GPa] [N] mN] [nm] Structure −200 V  0.495 10.5 ± 0.8  50 ± 5 605 ± 70 29 ± 1 61 ± 7 75 Columnar −110 V  0.453 7.1 ± 0.6 52 ± 3 600 ± 65 25 ± 1 32 ± 5 60 Columnar +10 V 0.287 0.5 ± 0.2 48 ± 4 580 ± 70 45 ± 1 26 ± 6 22 Fibrous +25 V 0.304 0.3 ± 0.2 49 ± 7 560 ± 95 43 ± 1 36 ± 8 18 Fibrous +35 V 0.286 0.7 ± 0.2 53 ± 7 640 ± 50 46 ± 3 32 ± 7 20 Fibrous +50 V 0.290 0.5 ± 0.2 54 ± 9 600 ± 85 42 ± 1 25 ± 3 15 Fibrous

EXAMPLE 2

Cemented carbide cutting tool inserts, solid exchangeable end mill MM16-20020-B120 PF-M04 (WC-6 wt % Co) type were coated with a 30 μm thick layer of TiB₂ according to example 1 using a bias, V_(s), of +50 V. The coated milling cutters were tested versus an uncoated variant of the same tool, in a copying milling operation of graphite, at 4000-6000 rpm, feed 700 mm/min

Variant Tool life, h Failure mode Uncoated 10 Flank wear, Vbmax 0.3 mm TiB₂ coated 40 Not end of tool life, Vbmax 0.1 mm

EXAMPLE 3

Inserts coated with TiB₂ according to example 1 were tested. Coating of TiN (prior art) were compared with two different TiB₂ coated variants, deposited using V_(s) of −110 V and +50 V, respectively. Also an uncoated variant was tested. The cemented carbide insert had a polished rake face prior to coating. The edge hone was sharp. The carbide had a composition of 6.0 wt-% Co, 0.5 wt-% TaC/NbC, balance WC. The coating of the insert consisted of TiN or TiB₂ with a total thickness of 3.0-4.0 μm.

Operation: Square shoulder milling Work piece: Plate Material: AA7075 Insert type: APEX160408FR-E08 Cutting speed: 800 m/min Feed: 0.2 mm/rev Depth of cut: 6.0-10.0 mm Remarks: dry milling

Time at first formation of Degree of build-up build-up Flank wear Variant edge(h) edge Vbmax (mm) Uncoated 2.3 Heavy 0.18 TiN 1.1 Heavy 0.11 TiB₂ 3.8 Small 0.05 (V_(s) = −110 V) TiB₂ 6.2 None Not measurable (V_(s) = +50 V)

EXAMPLE 4

A similar procedure to example 3 was utilized but using a lower cutting speed in order to promote build-up edge formation.

Operation: Square shoulder milling Work piece: Plate Material: AA7075 Insert type: APEX160408FR-E08 Cutting speed: 650 m/min Feed: 0.2 mm/rev Depth of cut: 6.0-10.0 mm Remarks: dry milling

Time at first formation of build-up edge Degree of build- Flank wear Variant (h) up edge Vbmax (mm) Uncoated 0.5 Very Heavy 0.21 TiN Immediate Very Heavy 0.18 TiB₂ 4.0 Heavy 0.08 (V_(s) = −110 V) TiB₂ 6.5 Small Not measurable (V_(s) = +50 V) 

1. A method of making a cutting tool insert comprising a substrate and a coating including at least one layer of TiB₂ having a fibrous microstructure by PVD magnetron sputtering, the method comprising utilizing a bias voltage of +5V to +60V.
 2. The method of claim 1, wherein the fibrous microstructure includes grains having an average diameter of 5 to 50 nm, a length more than 250 nm, and a length to diameter ratio greater than
 2. 3. The method of claim 2, wherein the average diameter is approximately 10 to 30 nm.
 4. The method of claim 3, wherein the average diameter is approximately 15 nm.
 5. The method of claim 2, wherein the grains are oriented essentially perpendicular to a surface of the substrate.
 6. The method of claim 1, wherein a thickness of the at least one layer of TiB₂ is from 0.5 μm to 60 μm.
 7. The method of claim 6, wherein the thickness is from 1 μm to 15 μm.
 8. The method of claim 1, wherein a total thickness of the coating is from 0.5 μm to 60 μm and the coating includes a TiB₂-layer having a thickness from 0.1 μm to 15 μm.
 9. The method of claim 8, wherein the total thickness of the coating is from 1 μm to 20 μm.
 10. The method of claim 1, comprising coating a top layer on the at least one layer of TiB_(2,) the top layer of metal nitrides and/or carbides and/or oxides of a metal element selected from Ti, Nb, Hf, V, Ta, Mo, Zr, Cr, W and Al.
 11. The method of claim 1, wherein the at least one layer of TiB₂ is an outermost layer having a surface roughness of not more than 50 nm.
 12. The method of claim 1, having a texture coefficient for a set of (001) crystal planes >5, wherein the texture coefficient is defined as: ${{TC}\quad({hkl})} = {\frac{I\quad({hkl})}{I_{0}\quad({hkl})}\left\lbrack {\frac{1}{n}{\sum\limits_{1}^{n}\frac{I\quad({hkl})}{I_{0}\quad({hkl})}}} \right\rbrack}^{- 1}$ where I(hkl)=measured intensity of the (hkl) reflection I_(O)(hkl)=standard intensity from the ASTM standard powder pattern diffraction data (JCPDS 35-0741) n=number of reflections used in calculation (hkl) reflections used are: (001), (100);(101), (110) (102+111), (201), (112) and (103+210), where (103+210) means the (103) and (210) reflections are treated as one reflection having a sum of intensity of the two reflections.
 13. The method of claim 1, wherein the substrate comprises 6 wt-% Co and WC and wherein a residual stress state in the at least one layer of TiB₂ is less than 0 GPa but greater than −1 GPa. 